How many nanometers is Canon mask aligner?

Canon mask aligner 22 nm, mask aligner is the key equipment for manufacturing MEMS, optoelectronics and diode LSI. There are two kinds of mask mask aligner: contact mask aligner, which has the same template and graphic size, and the template is close to the chip when exposed; The second is the stepper, which is similar to the projector principle and obtains a smaller exposure pattern than the template.

At present, the mask is mainly manufactured by Shanghai Microelectronics Equipment Co., Ltd., Guodian, the 45th Research Institute of Neutron Science and Technology Group Corporation, Hefei Xinshuo Semiconductor Co., Ltd., Xianteng Optoelectronics Technology and Wuxi Su Ying Semiconductor Technology. Among them, Shanghai Microelectronics Equipment Co., Ltd. has mass-produced 90 nm, which is the most advanced technology in China. Its national science and technology major project "VLSI manufacturing equipment and complete process project" was developed in 65nm mask aligner, and the whole machine is currently being evaluated. For mask aligner technology, 90 nm is a technical step; 45 nm is a technical step; 22 nm is a technical step ... It is not difficult to upgrade the technology from 90 nm to 65 nm, but 45 nm is much more difficult than 65 nm. The road has to go step by step. The national 16 major project 02 proposes that mask aligner will produce 22nm in 2020. At present, the mainstream is 45nm, while both 32nm and 28nm need to be improved and upgraded on deep ultraviolet mask aligner.