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As one of the key equipments in semiconductor industry, mask aligner plays an indispensable role in chip manufacturing. Recently, there have been significant changes. China has launched 46 high-end domestic mask aligner models, which indicates that China has made an important breakthrough in this field.

At present, Huawei has put 46 domestic mask aligner into use, making its chip manufacturing "completely independent". This move not only greatly improved the quality and performance of Huawei chips, but also provided strong support for the company's competitive position in the global market.

The emergence of 46 sets of domestic mask aligner indicates that China's semiconductor industry has successfully crossed this technical barrier. These mask aligner filled the gap in China's high-end mask aligner field, which not only improved China's chip manufacturing capability, but also enhanced the core competitiveness of China's semiconductor industry.

The role of mask aligner

Mask aligner, also known as mask alignment exposure machine, exposure system and lithography system, is the core equipment for manufacturing chips. Lithography, also known as optical lithography or ultraviolet lithography, is a precision machining process of patterning parts on a film or substrate (also known as a "wafer"). Mask aligner, in fact, is a kind of machine that prints the parts on the drawing onto the silicon wafer through a technology similar to photo printing.

To put it simply, mask aligner uses a series of light source energy and shape control means to transmit the light beam through a mask with a circuit diagram, compensate various optical errors through an objective lens, and map the circuit diagram to a silicon wafer after scaling down. Different mask aligner have different imaging scales, ranging from 5: 1 to 4: 1. Then the circuit diagram (chip) engraved on the silicon wafer is obtained by chemical development. In order to ensure micro-nano scale processing, the working environment in mask aligner needs ultra-clean environment.